| 摘要 |
PURPOSE:To obtain an image having superior adhesion to a substrate on which the image is formed, satisfactory etching resistance and high resolution by blending a specified resin with a photopolymerizable monomer, a photopolymn. initiator and a specified compound. CONSTITUTION:This photosetting composition contains, by weight, 100pts. resin (a) having structural units derived from at least one kind of alpha,beta-unsatd. ethylenic monomer, 10-300pts. photopolymerizable monomer (b), 0.1-20pts. photopolymn. initiator (c) and 0.01-1pts. compound (d) represented by formula I (where each of R<1> and R<2> is 1-10C alkyl, aryl or aralkyl, X<1> is O, S or NR<3>, X<2> is N or CR<4>, X<3> is N or CH, R<3> is H or 1-4C alkyl, and R<4> is H, halogen, NH2 or 1-4C alkyl). In case of <10pts. monomer (b), satisfactory setting is not carried out after exposure, and in case of >300pts. monomer (b), the unexposed part is so sticky that a fine image is not obtd. In case of <0.01pts. compound (d), the improvement of adhesion cannot be expected, and in case of >1pts. compound (d), phase separation from the resin component is liable to occur, so satisfactory resolution is not obtd. |
