APPARATUS FOR THE DEPOSITION OF A POLYCRYSTALLINE SILICON LAYER ON A CARBON RIBBON

摘要

A device for depositing a layer of polycrystalline silicon on a carbon tape comprises a bath of molten silicon through which the carbon tape is drawn vertically. Two semicircular channels are supported vertically in the vicinity of the edges of the tape with their concave side towards the tape. The channels are partially immersed in the bath so as to raise the level of its surface by capillary action. The device is applicable to the manufacture of solar cells.