| 摘要 |
An abrasive frit is disclosed comprising particles of a silicon nitride based material. The particles have essentially sharp edges and a particle size within the range of from about 0.5 to about 150 microns. An abrasive frit is disclosed as described above except that the edges of the particles are essentially smooth. A method is disclosed for producing a abrasive frit of silicon nitride based material. The method involves forming a body of silicon nitride based material, firing the body at a sufficient temperature for a sufficient time to form a relatively low density body which is then crushed to form fragmented material a portion of which comprises essentially sharp edged particles in the above given size range, followed by separating the particles from the balance of the fragmented material. At this point the sharp edged particles can be either polished to produce essentially smooth edges particles or left as is. The particles are then sintered at sufficient temperature and pressure for a sufficient time to form sintered material having a density of at least about 96% of the theoretical density of the silicon nitride based material. The sintered material is then deaggregated, followed by separating that portion of the sintered material having a particle size in the above given size range, which is the abrasive frit, from the balance of the deaggregated material.
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