| 摘要 |
<p>PURPOSE:To measure a vapor-deposited film, etc., speedily by computing the thickness, etc., of the vapor-deposited film from measurement data on its transmissivity, etc., by using a computer, etc. CONSTITUTION:Light wave length L, transmissivity T corresponding to the wavelength L, measured values T0, R0, and Rb0 of top surface and reverse surface reflection factors R and Rb, etc., are inputted to an initial value memory 500 previously. Then, the transmissivity T is calculated 200 while the value of the film thickness D is varied for sweep parameters (n) (reflection factor) and (k) (absorption coefficient) to find such film thickness that the difference dt=T-T0 in transmissivity is an extremely small value; and differences dr=R-R0 and drb=Rb-Rb0 in reflection factor are found by using the sweep parameters (n), (k), and D. Then, the values R and Rb are found from the values (n), (k), and D obtained by the calculator 200. Error distance is calculated 100 on the basis of the 200 and such initial values n0 and k0 of the parameters (n) and (k) that said values are minimum are found; while the parameters (n) and (k) are varied nearby the initial values n0 and k0, such values (n), (k), and D that the values dt, dr, and drb are smaller than specific extremely small values are calculated 300.</p> |
