| 摘要 |
PURPOSE:To improve the effective sensitivity of a resist and to execute satisfactory lithography by incorporating a fluorescent material which generates fluorescent rays by receiving the irradiation of energy into a photosensitive material. CONSTITUTION:The fluorescent material 7 which generates the fluorescent rays to sensitize the photosensitive material for execution of lithography by irradiating the irradiation energy generated form, for example, an X-ray source 1, etc., via a mask pattern 3 and projecting the pattern is incorporated into said photosensitive material. The photosensitive material i.e., the resist 6 is sensitized by both of the secondary irradiation rays from such fluorescent material 7 and the irradiation energy and therefore, the effective sensitivity of the resist is improved and the satisfactory lithography is made executable. The lithography is executable by the relieving strict conditions for X-ray transmittivity, thickness, etc. as a thin film 4 for holding the mask material. Since only the sensitivity is increased while the performances of the respective resists are maintained, this lithographic method is extremely advantageous. |
