发明名称 ELECTROLESS NICKEL PLATING METHOD
摘要 PURPOSE:To form a wear resistant film having fine luster by electroless plating at a high speed by using a body to be plated as the cathode in an electroless nickel plating bath and supplying a prescribed pulsating current so as to increase the catalytic activity on the cathode side. CONSTITUTION:The surface of a nonmetallic material is coated with a metallic film and the coated material is immersed in an electroless nickel plating bath contg. a nickel salt and a hypophosphite. The body to be plated is use as the cathode and a pulsating current having 0.1-100msec pulse length and suspension time is supplied at 0.1-3A/dm<2> average current density to form an Ni-P alloy film on the surface of the body to be plated.
申请公布号 JPS6263677(A) 申请公布日期 1987.03.20
申请号 JP19850203957 申请日期 1985.09.16
申请人 AISIN SEIKI CO LTD 发明人 KANO KEIICHI
分类号 C23C18/16;C23C18/36;C23C18/54 主分类号 C23C18/16
代理机构 代理人
主权项
地址