| 摘要 |
PURPOSE:To permit the control of a gap thickness and simplification of stages by forming a gap layer by a lift off method prior to the formation of an upper magnetic pole. CONSTITUTION:Al2O3 which is an under coat film 4 is deposited by sputtering on an Al2O3-TiC substrate 5 and further a lower magnetic layer 3 is formed on the film 4. An insulating layer 2 and coil 1 are successively and repeatedly formed. the surface is coated with a resist 6 except the gap part 8 prior to the formation of the upper magnetic layer 9; thereafter an SiO2 film which is the gap layer is deposited by sputtering to 0.7mum. The resist 6 is removed after sputtering of SiO2 to leave only the gap part which is a desired part, thus forming the upper magnetic layer 9. Damages by ion etching, etc. generated in the stage of manufacturing the coil are eliminated by executing the manufacture in the above-mentioned stages and therefore, the initially deposited film thickness is maintained. |
