| 摘要 |
<p>PURPOSE:To form a fine dye pattern and to simplify a dyeing process by performing dyeing by using an LB film for a resist printing mask pattern. CONSTITUTION:A photodetector 1 is embedded in an image sensor substrate 2 and a resin body 3 with chromatophilia is laminated thereupon. Further, a Langmuir-Blodgette film (LB film) 4 consisting of molecules having unsaturated bonds is laminated and exposed to an electron beam, exposed parts are superposed, and nonreaction parts are solved out with a developer to form the resist printing mask pattern. This pattern is used for dyeing to form a dyed part 5 and the LB film 4 is separated by etching. Thus, the LB film 4 is used, so a fine pattern is obtained and the dyeing processing is made easier than before.</p> |
