| 摘要 |
PURPOSE:To enable rapid stripping and retention of stripping action for a long time by using a composition consisting of secified ethylene oxide adduct of alkanol amine or polyalkylene-polyamine, a specified sulfone compound, and a specified glycol monoalkylether. CONSTITUTION:The stripping agent composition consists of 10-50pts.wt. of the ethylene oxide adduct of alkanolamine represented by the formula: H3-nN[(CH2)mOH]n or polyalkylene-polyamine represented by the formula: H2 N[(CH2)xNH]yH; 1-20pts.wt. sof the sulfone compound represented by the formula: R<1>SO2-R<2>; and 30-89pts.wt. of glycol monoalkyl ether represented by the formula: HO-(C2H4O)p-R. This stripping agent composition is brought into contact with a photoresist film attached to an inorganic substrate, usually, at a temperature of 40-90 deg.C, preferably, 60-80 deg.C, then washed with water, and dried, thus permitting the substrate perfectly stripped of the photoresist film to be obtained. |
