发明名称 FOCAL PLANE ADJUSTED PHOTOMASK AND METHODS OF PROJECTING IMAGES ONTO PHOTOSENSITIZED WORKPIECE SURFACES
摘要 <p>FOCAL PLANE ADJUSTED PHOTOMASK AND METHODS OF PROJECTING IMAGES ONTO PHOTOSENSITIZED WORKPIECE SURFACES In the operation of a projection printer photomasks, the patterns of which are protected by coverplate, are used interchangeably with other photomasks, the patterns of which are located at an open surface thereof. The photomasks feature shims which space the patterns away from a plane of support surfaces of a mounting chuck by a precise distance equal to the shift of the object plane with respect to an image plane because of the presence of the coverplate in the optical path of the projection printer.</p>
申请公布号 CA1218763(A) 申请公布日期 1987.03.03
申请号 CA19850480580 申请日期 1985.05.02
申请人 AMERICAN TELEPHONE AND TELEGRAPH COMPANY 发明人 BANKS, EDWARD L.;ELLINGTON, THOMAS S., IV;ZAVECZ, TERRENCE E.
分类号 G03F1/64;G03F7/20;G03F7/207;G03F9/02;H01L21/027;H01L21/30;(IPC1-7):H01L21/42 主分类号 G03F1/64
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