发明名称 FORMATION OF FINE PATTERN
摘要 PURPOSE:To make almost no difference in size between the fine patterns formed in the first exposure and those formed in the second and subsequent exposures by a method wherein the exposing energy used in the second and subsequent exposures is made lower than the exposing energy of the first exposure using the photomask whereon a contrast emphasizing film is coated. CONSTITUTION:When a transmitted light is made incident on a CEL (contrast emphasizing film) 2, a bleaching action is generated corresponding to the intensity of the transmitted light, transmission factor becomes larger in a bleached region 6, the transmission factor becomes small in a non-bleached region 7 due to the feebleness of the transmitted light, and the contrast of the transmitted light of a photomask 1 is improved remarkably. At this point, when an exposure is performed continuously on a plurality of substrates or chips using the same exposing energy, the non-bleached region 67 of the CEL 2 is reduced in size every time an exposure is performed, and the effect of CEL goes out. In order to suppress the bleaching of the non-bleached region 7, the exposing energy used in the second and subsequent exposure is made lower than that used in the first exposure.
申请公布号 JPS6239014(A) 申请公布日期 1987.02.20
申请号 JP19850178333 申请日期 1985.08.13
申请人 MATSUSHITA ELECTRIC IND CO LTD 发明人 NAGANO KAZUTOSHI
分类号 G03F1/00;G03F1/76;G03F7/20;H01L21/027;H01L21/30 主分类号 G03F1/00
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