TREATMENT OF PHOTOSENSITIVE LITHOGRAPHIC PLATE

摘要

PURPOSE:To make it possible to process a negative type photosensitive lithographic (PS) plate and a positive type PS plate with the same solution even under a condition that the generation of waste liquid is extremely little by processing the negative type PS or the positive PS with the same solution containing acid immediately after the development of the PS plate and then processing the PS plate with the same non-sensitive aliphatic solution or a surface active agent. CONSTITUTION:After being developed, the negative type PS plate or the positive type PS plate is immediately processed with the same solution containing acid and then processed by the same solution containing the non-sensitive aliphatic solution or a surface active agent. Generally, the non-sensitive aliphatic solution is used with about 1-60wt%. The processing solution can be stably used over a long period and its management is also easy.