FOTOLACKE ZUR AUSBILDUNG VON RELIEFSTRUKTUREN AUS HOCHWAERMEBESTAENDIGEN POLYMEREN.,申请号AT19830108447T-传众专利搜索

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发明名称	FOTOLACKE ZUR AUSBILDUNG VON RELIEFSTRUKTUREN AUS HOCHWAERMEBESTAENDIGEN POLYMEREN.
摘要
申请公布号	AT25433(T)	申请公布日期	1987.02.15
申请号	AT19830108447T	申请日期	1983.08.27
申请人	MERCK PATENT GESELLSCHAFT MIT BESCHRAENKTER HAFTUNG	发明人	KLUG, RUDOLF, DR.;HAERTNER, HARTMUT, DR.;MERREM, HANS-JOACHIM, DR.;NEISIUS, KARL HEINZ, DR.
分类号	C08F291/18;(IPC1-7):G03C1/68	主分类号	C08F291/18
代理机构		代理人
主权项
地址

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