| 摘要 |
PURPOSE:To enhance selective solubility of exposed and unexposed parts and to reduce temperature dependency of the solubility of the exposed parts by adding a specified amount of an acetylene alcohol type surfactant to a developing solution using an organic base containing no metal ion as an essential agent for use in a positive type photoresist. CONSTITUTION:The acetylene alcohol type surfactant is added to the developing solution in an amount of 50-5,000ppm of the developing solution of the positive type photoresist using an organic base as an essential agent containing no metal ion, thus permitting the developing solution to have both of a surface active effect (wettability) and an antifoaming effect, foaming to be prevented when the positive type photoresist is developed in a still process, the developing solution to spread rapidly on the photoresist film, accordingly, uniform good development to be executed, the dependency of solubility on temperature to decrease, and allowance of a development process to be enlarged. |
