发明名称 Electrode plate and jig for use in plasma etching
摘要 An electrode plate for use in plasma etching, which includes a vitreous carbon material produced from a polycarbodiimide resin as a raw material, or from a phenolic resin and a polycarbodiimide resin each as a raw material. The vitreous carbon material produced from a polycarbodiimide resin or from a phenolic resin and a polycarbodiimide resin, has no or substantially no pores and has a high strength. Therefore, it exhibits excellent properties when used in an electrode plate for plasma etching.
申请公布号 US5871609(A) 申请公布日期 1999.02.16
申请号 US19930071399 申请日期 1993.06.04
申请人 NISSHINBO INDUSTRIES, INC 发明人 SAITO, KAZUO;ISHIMATSU, TAKESHI
分类号 C04B35/524;H01J37/32;(IPC1-7):C23F1/02;H01B1/04 主分类号 C04B35/524
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