发明名称 |
Electrode plate and jig for use in plasma etching |
摘要 |
An electrode plate for use in plasma etching, which includes a vitreous carbon material produced from a polycarbodiimide resin as a raw material, or from a phenolic resin and a polycarbodiimide resin each as a raw material. The vitreous carbon material produced from a polycarbodiimide resin or from a phenolic resin and a polycarbodiimide resin, has no or substantially no pores and has a high strength. Therefore, it exhibits excellent properties when used in an electrode plate for plasma etching.
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申请公布号 |
US5871609(A) |
申请公布日期 |
1999.02.16 |
申请号 |
US19930071399 |
申请日期 |
1993.06.04 |
申请人 |
NISSHINBO INDUSTRIES, INC |
发明人 |
SAITO, KAZUO;ISHIMATSU, TAKESHI |
分类号 |
C04B35/524;H01J37/32;(IPC1-7):C23F1/02;H01B1/04 |
主分类号 |
C04B35/524 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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