| 摘要 |
PURPOSE:To develop a large-sized target which is free from chipping off and cracking in the stage of producing a target for sputtering of an alloy consisting of a transition metal and rare earth element by metallurgically joining the target material onto a metallic substrate. CONSTITUTION:The target formed by metallurgically joining a target alloy 1 by a thermal spraying, build-up welding, hot pressing, hot hydrostatic pressing or brazing method onto a strap plate 2 consisting of high-purity Fe, Ni, Cu, etc., is used as the target for sputtering to be used for forming a thin alloy film of 2-4 elements consisting of the transition metal and rare earth metal by a sputtering method onto the substrate. Such target as a cathode is brazed onto a backing plate 3 and the large-sized target which is free from the chipping off, cracking, etc., during handling and can form the thin film having the uniform compsn. on the substrate is produced. |
