| 摘要 |
PURPOSE:To shield and seal a light shield film substantially from the outside and to form a reduced pattern with high precision by arranging a light- transmittable plate member whose both surfaces are treated for prevention against reflection on a substrate oppositely to the substrate across the light shield film where a pattern is to be formed and separately from the light shield film. CONSTITUTION:The light shield film 12 made of Pb, Te, or Se which is easily worked by a laser is arranged on the transparent substrate 1 of a photomask and the light shield pattern 12' made of a Pb, Te, or Se thin film after laser working is formed for the light shield film 12. This light shield film 12 is separated by a frame 2 and a reflection preventing film 9 is formed, and a reflection preventing film 10 is formed across cover glass 3. Both surfaces of each of the reflection preventing films 9 and 10 are treated for reflection prevention and the light shield film 12 is shielded and sealed substantially from the outside. Then, the reduced pattern is formed accurately with high reliability. |
