| 摘要 |
PURPOSE:To obtain a photosensitive body having large electrostatic chargeability by depositing an insulating material on a conductive substrate at a prescribed thickness and using a metallic or conductive compd. to manufacture a conductive part thereon and further thinly depositing a photosensitive material thereon. CONSTITUTION:This photosensitive body is constituted by consisting the same of the conductive part which is provided on a conductive base body deposited with the insulating material having 2.0-16.5 specific dielectric constant to preferably 1,000Angstrom -300mum thickness and has the network pattern consisting of the metal or conductive compd. and depositing an amorphous semiconductor on the non-conductive part where the conductive part is not provided. The insulating material which is deposited on the conductive substrate and has 2.0-16.5, more preferably 2.0-7.0 specific dielectric constant is exemplified by silicon dioxide, etc. Capacity C increases and surface potential decreases if the thickness of the insulating layer is <1,000Angstrom and the surface condition after coating is not desirable when the thickness exceeds 500mum. |
