| 摘要 |
PURPOSE:To reduce the production cost of a color filter by forming marks for positioning on a substrate, a pattern for the formation of a color filter and positioning marks on one photomask. CONSTITUTION:The positioning marks 2-4 and a pattern 8 for the formation of the color filter are masked on the photomask 1 and then the substrate 9 is turned upside-down to form the positioning marks 10-12. An Al film is applied to the whole surface of the substrate 9, photoresist is applied to the whole surface of the Al film, the film surface is exposed by using the photomask 1, and the exposed film is developed and etched to form the positioning marks 10-12 with the Al film. Then, a dyeing enable resin film 13 is formed on the substrate 9 by using gelatin or the like, a photoresist film 14 is applied to the surface of the film 13, the lower marks 5-7 and two positioning marks 3, 4 out of the upper three positioning marks 2-4 on the photomask 1 are masked, and the positioning mark 2 is matched with the positioning mark 10 on the substrate 9 to expose the whole surface. |
