发明名称 Heat-developable photosensitive material
摘要 A heat-developable photosensitive material which contains a compound of the general formula: <IMAGE> (I) <IMAGE> (II) wherein F and F' each represents an atomic group necessary for the formation of a 5- or 6-membered rings which may have condensed rings; n represents an integer of 0 or 1; R1 and R2 which may be the same or different, each represents a hydrogen atom, a halogen atom, a hydroxyl group, a cyano group, or a substituted or unsubstituted alkyl group, cycloalkyl group, alkenyl group, alkynyl group, aryl group, heterocyclic residual group, aralkyl group, alkoxy group, aryloxy group, acylamino group, acyloxy group, acyl group, carbamoyl group, sulfamoyl group, sulfamoylamino group, ureido group, alkylsulfonyl group, arylsulfonyl group, alkylsulfonylamino group, arylsulfonylamino group, alkoxycarbonyl group or alkoxycarbonylamino group, or -CO2M; and R1 and R2 may be combine and form a ring, M is an alkali metal or H.Bx in which B represents an organic base; and x represents an integer of 1 when B is a monoacidic base and represents 1/2 when B is a diacidic base.
申请公布号 US4636462(A) 申请公布日期 1987.01.13
申请号 US19850769288 申请日期 1985.08.26
申请人 FUJI PHOTO FILM CO., LTD. 发明人 KAWATA, KEN;YABUKI, YOSHIHARU;SATO, KOZO;HIRAI, HIROYUKI
分类号 B41M5/26;C07D207/34;C07D209/42;C07D213/80;C07D213/89;C07D215/48;C07D231/14;C07D231/56;C07D233/90;C07D235/24;C07D237/30;C07D239/28;C07D241/24;C07D249/08;C07D251/20;C07D253/06;C07D259/00;C07D261/10;C07D263/34;C07D263/58;C07D271/08;C07D521/00;G03C1/06;G03C1/498;G03C7/00;G03C8/40;(IPC1-7):G03C1/02 主分类号 B41M5/26
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