| 发明名称 |
High concentration sodium permanganate etch bath and its use in desmearing and/or etching printed circuit boards. |
| 摘要 |
<p>A high concentration aqueous NaMnO4 solution which provides a high etch rate for printed circuit boards and the like. The solution contains NaOH in an amount sufficient to allow the removal of substantially all the manganese residues from the treated substrate by acid neutralization. The solution can be used inter alia for desmearing and etching back. </p> |
| 申请公布号 |
EP0207587(A1) |
申请公布日期 |
1987.01.07 |
| 申请号 |
EP19860302338 |
申请日期 |
1986.03.27 |
| 申请人 |
MORTON THIOKOL, INC. |
发明人 |
KRULIK, GERALD |
| 分类号 |
C11D7/06;C08J7/12;C09K13/00;C09K13/02;C11D7/10;C11D7/60;C23C18/22;C23G1/14;H05K3/00;H05K3/26;(IPC1-7):C23C18/22;H05K3/42 |
主分类号 |
C11D7/06 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
|
| 地址 |
|
