MASKING MATERIAL FOR VAPOR DEPOSITION

摘要

PURPOSE:To improve both the bend of a base plate in case of taking off a mask from the base plate and the deviation of a vapor-deposited position by forming a thin ceramic film having the prescribed thermal expansion coefficient on the surface of the masking material for the prescribed vapor deposition having the same material as the base plate. CONSTITUTION:A mask 5 for the vapor deposition consisting of the same Fe-42% Ni material as a base plate 4 is prepared. A thin ceramic film 5a wherein a vapor deposition substance 2 is hardly vapor-deposited thereon and it has the thermal expansion coefficient close to the mask 5 material is provided on the surface of the mask 5. The part excepting a prescribed region of the base plate 4 is covered with the mask 5 and only the prescribed region is vapor- deposited. In such a way, the bend of the base plate 4 in case of taking off the mask 5 from the base plate 4 after the finish of the vapor deposition and the deviation of a vapor-deposited position due to the difference of the thermal expansion coefficient are prevented.