| 摘要 |
PURPOSE:To form a nonmagnetic oxide material film such as SiO2 so as to play the role of a buffer material against stress by forming said film to a substantial thickness on the thin film of a magnetic metallic material such as 'Sendust(R)' and joining the thin film via said nonmagnetic oxide material film to welding glass. CONSTITUTION:The SiO2 film 15 is formed on the thin film 9 of the magnetic metallic material such as 'Sendust(R)' and the surface thereof is polished to a specular surface to form the SiO2 film for a gap, thereby forming the substantially thick SiO2 film to a sloped part 8a of the 1st groove 8. The sloped part 8a of the 1st groove 8 eventually has 0.3mum SiO2 film and the welding of glass is executed at 800 deg.C. The coefft. of thermal expansion of the SiO2 film 15 is between the coeffts. of thermal expansion of the film 9 and the glass 13; in addition, the SiO2 film is easibly diffusible in the glass to constitute a compressive stress layer on the surface of the glass 13. The thermal stress between the glass 13 and the thin film 9 is thereby buffered by the SiO2 film.
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