Method for measuring and/or regulating a particle stream

摘要

The invention relates to a method for measuring and/or regulating a particle stream, especially for a vacuum deposition system. According to this method, the particle stream emitted by a particle source is first ionized at least partially and is deposited on a substrate to which an electric direct voltage has been applied. The electric current then flowing can be used to determine the deposition rate and/or the layer thickness.