发明名称 DEPOSITED FILM FORMING DEVICE BY CVD METHOD
摘要 PURPOSE:To educe the size of a device and to stabilize quality as well as electrical and optical characteristics by providing a substrate supporting cylinder or the like into a reaction vessel which is made to a cylindrical shape and attaching plural pieces of the substrates onto the inside wall surface of the supporting cylinder. CONSTITUTION:The substrate supporting cylinder 2 attached with plural sheets of the substrates 3 is carried into a reaction space A of the hermetically closed reaction vessel 1 and is heated by a heating means 12. On the other hand, a gaseous raw material for forming an active seed is introduced into the pace B of an activation chamber 9 where the active seed is formed. The active seed and the gaseous raw material are supplied via an active seed supply pipe 7 and gaseous raw material supply pipe 6 disposed coaxially with the above- mentioned cylinder 2 into the space A. The deposited films are thus formed on the substrates 3.
申请公布号 JPS61288072(A) 申请公布日期 1986.12.18
申请号 JP19850129941 申请日期 1985.06.17
申请人 CANON INC 发明人 KAMIYA OSAMU
分类号 C23C16/44;C23C16/455;G03G5/08 主分类号 C23C16/44
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