| 摘要 |
PURPOSE:To prevent the exposing of a resin which determines a gap depth on a floating surface by etching the 1st magnetic film with a mask material to obtain the 1st magnetic material then sticking an inorg. insulating film over the entire substrate surface so as to have approximately the same thickness as the thickness of the 1st magnetic material and removing the mask material and the inorg. insulator sticking onto said material. CONSTITUTION:The 1st magnetic film 20 is deposited on the substrate 1 and is then etched by a phosoresist mask 2' to form the 1st magnetic material 2. The inorg. insulating film 9 consisting of an alumina film, etc. is then deposited over the entire surface to have approximately the same thickness as the thickness of the material 2 and the mask 2' is removed to form a gap material 3 consisting of alumina, etc. over the entire surface. The surface formed with the gap material 3 is nearly flat. The insulating film 4 consisting of the photoresist, etc. to determine the gap depth is thereafter formed on the surface. Since the forming surface of the film 4 is nearly flat, the projection of the film toward the floating surface side from the point P to determine the gap depth on the 1st magnetic material 2 is thus obviated. |
