发明名称 PHOTOSENSITIVE POLYMER COMPOSITION
摘要 PURPOSE:The titled composition, obtained by incorporating specific amounts of a specific polyamic acid with aromatic bisazide compound, amine compound and fluorine-containing organic compound, having good covering properties even when floating dust sticks thereto and suitable for electronic parts, e.g. semiconductor elements, etc. CONSTITUTION:A photosensitive polymer composition obtained by incorporating (A) 100pts.wt. polyamic acid consisting of repeating units expressed by formula I (R<1> is tri- or tetrafunctional organic group; R<2> is bifunctional organic group; n is 1 when R<1> is trifunctional and 2 when R<1> is tetrafunctional) alone or consisting essentially thereof with (B) 0.1-100pts.wt., preferably 0.5-50pts.wt. aromatic bisazide compound expressed by formula II [X is -OH, OR<3> (R<3> is lower alkyl), etc.], (C) 1-400pts.wt. amine compound expressed by formula III (R<5>-R<7> and R<9> are H, etc.; R<8> is alkylene) and (D) 1-500pts.wt. fluorine- containing organic compound expressed by formula IV or V (R<10>-R<12> are H or F; R<13> is H or OH; R<14> is H, etc.; l is an integer 1-15. etc.).
申请公布号 JPS61285254(A) 申请公布日期 1986.12.16
申请号 JP19850126140 申请日期 1985.06.12
申请人 HITACHI LTD;HITACHI CHEM CO LTD 发明人 KATAOKA FUMIO;SHOJI FUSAJI;KATO TOKIO;OKUBO TOSHIO;KOJIMA MITSUMASA
分类号 C08K5/00;C08K5/06;C08K5/17;C08K5/28;C08L79/08;G03F7/008;G03F7/038;H01B3/30 主分类号 C08K5/00
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