发明名称 |
Deflection lens system for generating a beam of neutral particles of variable cross section |
摘要 |
An apparatus for deflecting and focusing a beam of neutral particles for operating on extremely small workpieces, such as for doping or inscribing micro-electronic components, has a deflection system for generating at least one magnetic field through which the beam of neutral particles is directed for focusing and shaping of the beam on the workpiece. The lens system may include one or more six-pole or eight-pole lenses.
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申请公布号 |
US4629899(A) |
申请公布日期 |
1986.12.16 |
申请号 |
US19860817167 |
申请日期 |
1986.01.08 |
申请人 |
SIEMENS AKTIENGESELLSCHAFT |
发明人 |
PLIES, ERICH |
分类号 |
G21K1/08;G21K1/093;G21K5/04;H01J37/141;H01J37/30;H01L21/027;H05H7/00;(IPC1-7):G21K1/08;H05H3/00 |
主分类号 |
G21K1/08 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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