| 摘要 |
PURPOSE:The titled apparatus, having plural gas discharge passages equipped with opening and shutting valves connected to a reaction chamber and further illuminance sensors, capable of controlling the opening and shutting valves based on signals from the sensors, making the distribution of a plasma gas uniform and carrying out uniform plasma treatment on the surface of a material to be treated. CONSTITUTION:A plasma treating apparatus having a plasma reaction chamber with the cross section expressed by Fig. 1, plural gas discharge passages (70)-(78) connected to the reaction chamber 3, opening and shutting valves (110-118) opening and shutting the gas discharge passages (70)-(78) and further illuminance sensors (160)-(168) provided in the respective gas discharge passages, detecting the emission quantity of the plasma passing through the respective gas discharge passages, outputting signals according to the emission quantity and controlling the opening and shutting valves to make the amount of the plasma discharged from the respective gas discharge passages mutually equal. |
