发明名称 ION IMPLANTING DEVICE
摘要 PURPOSE:To reduce a space to be occupied by an ion implanting device by adding together those voltage generated respectively by the halved high-tension power supply devices for obtaining prescribed acceleration voltage to be impressed on an accelerating tube. CONSTITUTION:A metal container 4 houses a DC high-tension generator 71 serving as the first high-tension power supply device having a high-tension insulating transformer 8 as power supply and a high-tension DC terminal with negative polarity to the metal container 4, while on the earth side a DC high-tension generator 72 serving as the second high-tension current device having the high-tension DC terminal with positive polarity to the earth is arranged and the respective output terminals are mutually connected between the metal container 4 and the earth. Accordingly, the potential at the connection part of both terminals gets to be output voltage (>0) of the DC high-tension generator 72 on the basis of the earth while being output voltage (<0) of the DC high-tension generator 71 on the basis of the metal container 4 so that the potential of the metal container 4 on the basis of the ground becomes a sum of the absolute value of the generated voltages of the respective DC high-tension of the respective DC high-tension generators. Thereby, the prescribed accelerating voltage can be impressed on the accelerating tube by two DC high-tension generators small-sized and different only in their polarity.
申请公布号 JPS61271737(A) 申请公布日期 1986.12.02
申请号 JP19850113699 申请日期 1985.05.27
申请人 FUJI ELECTRIC CO LTD 发明人 FURUYA MASAYASU
分类号 H01J37/317;H01L21/265 主分类号 H01J37/317
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