| 摘要 |
PURPOSE:To increase utilization of negative active material by forming metallic nickel on the surface of cadmium oxide powder by a vacuum deposition method or a cathode sputtering method. CONSTITUTION:Metallic nickel is formed on the surface of cadmium oxide powder by a vacuum deposition method or a cathode sputtering method, and this material is used as active material powder. By this method, very fine metallic nickel having a particle size of 1/100-1/10mum is uniformly distributed on the cadmium oxide powder. In a plate using this cadmium oxide, the fine metallic nickel on the cadmium oxide powder is in contact with the metallic nickel on the adjacent cadmium oxide powder to form a continuous conductive matrix in the plate. Therefore, even in the high rate charge-dischrage, transfer of electrons is performed smoothly and uniformly, and utilization of the negative active material is increased even in high rate charge-discharge. |
