发明名称 VACUUM DEPOSITION FURNACE
摘要 PURPOSE:To make the distribution of vacuum deposition uniform and to prevent edge-up or edge-down by dividing the shutter of a vacuum deposition apparatus into plural shutters so that the degrees of opening of the shutters can be regulated according to outputs from a film thickness measuring device. CONSTITUTION:A steel strip 1 is plated during passing over a vacuum deposition hole 6, and the thickness of the resulting film is measured with a film thickness measuring device 11 at plural positions. Outputs from the device 11 are fed back to shutter driving devices 13, and the degrees of opening of divided shutters 14a, 14b, 14c are separately regulated with the devices 13.
申请公布号 JPS61261477(A) 申请公布日期 1986.11.19
申请号 JP19850101591 申请日期 1985.05.15
申请人 MITSUBISHI HEAVY IND LTD;RYOMEI ENG CORP LTD 发明人 KATO MITSUO;TAUCHI KUNIAKI;FURUKAWA HEIZABURO;FUMIYA SAKAE
分类号 C23C14/54 主分类号 C23C14/54
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