发明名称 PLATING METHOD FOR 'PERMALLOY(R)'
摘要 PURPOSE:To make uniform compsn. and to obtain the stability of a magnetic domain by impressing an external magnetic field superposed with a DC magnetic field and AC magnetic field during 'Permalloy(R)' plating. CONSTITUTION:A magnetic core is produced by 'Permalloy(R)' plating while the external magnetic field is impressed. The external magnetic field superposed with the DC magnetic field and AC magnetic field is impressed. >=300 oersted, more preferably >=500 oersted are considered to be necessary even for flame plating when a demagnetizing field is taken into consideration in the case of directing the direction of easy magnetization of the 'Permalloy(R)' toward the direction where the external magnetic field is impressed. However, >=1k oersted is necessary in partial plating where no flame is used and therefore the impression of such strong magnetic field to a plating cell for mass production is difficult. The magnetic anisotropy equal to the magnetic anisotropy of the flame plating is therefore provided by superposing the DC magnetic field and the AC magnetic field in the partial plating in which the flame is not used.
申请公布号 JPS61255519(A) 申请公布日期 1986.11.13
申请号 JP19850098675 申请日期 1985.05.09
申请人 SEIKO EPSON CORP 发明人 TOGAWA EIJI;MIYASAKA YOSHIYUKI;MURAI MASAMI
分类号 G11B5/31;H01F41/02;H01F41/26 主分类号 G11B5/31
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