发明名称 |
Process for the wet-chemical preparation of a metal layer |
摘要 |
<p>The invention relates to a process for the wet-chemical preparation of thermally stressable metal layers by deposition from essentially inorganic, additive-free electrolytes, interruption of the electrodeposition by interannealing and the incorporation of discrete particles produced during the formation of the metal layer or suspended in the deposition electrolyte.</p> |
申请公布号 |
DE3513266(A1) |
申请公布日期 |
1986.10.23 |
申请号 |
DE19853513266 |
申请日期 |
1985.04.13 |
申请人 |
LICENTIA PATENT-VERWALTUNGS-GMBH |
发明人 |
OSTWALD,ROBERT,DR.-ING.;VOIT,GABRIELE;SCHOEDLBAUER,REINHARD |
分类号 |
C23C18/18;C23C18/31;C25D5/54;H05K3/38;(IPC1-7):C25D5/54;C25D15/00;C23C18/40;C25D13/00 |
主分类号 |
C23C18/18 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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