发明名称 Process for the wet-chemical preparation of a metal layer
摘要 <p>The invention relates to a process for the wet-chemical preparation of thermally stressable metal layers by deposition from essentially inorganic, additive-free electrolytes, interruption of the electrodeposition by interannealing and the incorporation of discrete particles produced during the formation of the metal layer or suspended in the deposition electrolyte.</p>
申请公布号 DE3513266(A1) 申请公布日期 1986.10.23
申请号 DE19853513266 申请日期 1985.04.13
申请人 LICENTIA PATENT-VERWALTUNGS-GMBH 发明人 OSTWALD,ROBERT,DR.-ING.;VOIT,GABRIELE;SCHOEDLBAUER,REINHARD
分类号 C23C18/18;C23C18/31;C25D5/54;H05K3/38;(IPC1-7):C25D5/54;C25D15/00;C23C18/40;C25D13/00 主分类号 C23C18/18
代理机构 代理人
主权项
地址