发明名称 |
X-ray lithography system |
摘要 |
A system is provided for producing plasma pinch X-rays usable in X-ray lithography. Ionized heated plasma is repeatably generated in a first area directly from solid material without exploding the latter. X-rays are generated in a second area by passing high current through the plasma causing radial inward magnetic field pinching. Accurate control and improved intensity performance, and greater flexibility in selection of X-ray emitting materials, are provided by the separation of the plasma generating and the X-ray pinch generating functions. Common electrode structure is provided for plasma generating and for plasma pinching, which common electrode also provides a cylindrical plasma communication passage from the first to the second area, and provides an X-ray emission passage of desired axial orientation.
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申请公布号 |
US4618971(A) |
申请公布日期 |
1986.10.21 |
申请号 |
US19840651052 |
申请日期 |
1984.09.13 |
申请人 |
EATON CORPORATION |
发明人 |
WEISS, ARNOLD;SCHUTTEN, HERMAN P.;CARTZ, LOUIS;SPELLMAN, GORDON B.;JASKOLSKI, STANLEY V.;WACKMAN, DECEASED, PETER H. |
分类号 |
G03F7/20;H05G2/00;H05H1/04;(IPC1-7):G21K5/00;H01L21/302 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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地址 |
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