发明名称 LIQUID METAL ION SOURCE
摘要 PURPOSE:To stabilize an emitted ion beam and reduce the power consumption by providing a liquid metal ion source having an emitter of a sharp-pointed tip with a heater which heats entire ionized material and a heater which heats the tip of the emitter. CONSTITUTION:A sump for an ionized material 2 such as Ga is provided with a heater 3 required for maintaining the ionized material 2 in molten state. An emitter 4 of a sharp-pointed tip penetrating through the sump for the material 2 is provided with a surrounding capillary 1 to heat the tip of the emitter 4 locally to a high temperature with a heater 7. A high voltage is applied across the emitter 4 and a draw-electrode 6 to take out a stable ion beam 5 efficiently. Thus power consumption is reduced because not the entire ionized material 2 is heated to a high temperature, and the ion beam 5 is also stably taken out.
申请公布号 JPS61230237(A) 申请公布日期 1986.10.14
申请号 JP19850070886 申请日期 1985.04.05
申请人 HITACHI LTD 发明人 HARAICHI SATOSHI;MIYAUCHI TAKEOKI;SHIMASE AKIRA;YAMAGUCHI HIROSHI
分类号 H01J27/26;H01J37/08 主分类号 H01J27/26
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