发明名称 |
Plasma CVD apparatus for making photoreceptor drum |
摘要 |
A plasma CVD (chemical vapor deposition) apparatus of the capacitance coupling type for effecting the chemical vapor deposition on a drum which includes an air tight chamber made of an electrically conductive material, a support provided in the chamber for supporting the drum inside the chamber in an electrically insulated relationship with the chamber, and an RF power source for supplying RF power to the drum. The chamber is grounded and, therefore, the plasma is generated between the drum and inside wall of the chamber. The apparatus is provided with means for providing a smooth surface on the drum. The drum can be used as a photoreceptor for use in an electrophotographic copying machine.
|
申请公布号 |
US4615299(A) |
申请公布日期 |
1986.10.07 |
申请号 |
US19850709185 |
申请日期 |
1985.03.07 |
申请人 |
SHARP KABUSHIKI KAISHA |
发明人 |
MATSUYAMA, TOSHIRO;HAYAKAWA, TAKASHI;KOJIMA, YOSHIMI;NARIKAWA, SHIRO;EHARA, SHAW |
分类号 |
C23C16/50;C23C16/509;G03G5/08;G03G5/082;H01J37/32;(IPC1-7):C23C13/08 |
主分类号 |
C23C16/50 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|