发明名称 |
ION BEAM LITHOGRAPHY EQUIPMENT |
摘要 |
PURPOSE:To enable to draw a desired figure continuously while changing the dose of ions arbitrarily by a method wherein the title equipment is provided CONSTITUTION:Ion beams are deflected stepwise to shift the position of drawn material 5 which is irradiated with ion beams for drawing. The title equipment. |
申请公布号 |
JPS61224418(A) |
申请公布日期 |
1986.10.06 |
申请号 |
JP19850065828 |
申请日期 |
1985.03.29 |
申请人 |
JEOL LTD |
发明人 |
HITOSUGI AKIO;MANABE HIRONOBU |
分类号 |
H01J37/317;H01J37/305;H01L21/027;H01L21/30 |
主分类号 |
H01J37/317 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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