发明名称 ION BEAM LITHOGRAPHY EQUIPMENT
摘要 PURPOSE:To enable to draw a desired figure continuously while changing the dose of ions arbitrarily by a method wherein the title equipment is provided CONSTITUTION:Ion beams are deflected stepwise to shift the position of drawn material 5 which is irradiated with ion beams for drawing. The title equipment.
申请公布号 JPS61224418(A) 申请公布日期 1986.10.06
申请号 JP19850065828 申请日期 1985.03.29
申请人 JEOL LTD 发明人 HITOSUGI AKIO;MANABE HIRONOBU
分类号 H01J37/317;H01J37/305;H01L21/027;H01L21/30 主分类号 H01J37/317
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