| 摘要 |
PURPOSE:To improve the adhesion of a thin chromium film by regulating the amount of iron contained inevitably in a chromium target for sputtering used to form a thin chromium film to a specified value. CONSTITUTION:A chromium target for sputtering used to form a thin chromium film contains inevitably 70-5,000ppm iron in general. This iron deteriorates the adhesion of a formed thin chromium film to a base, so the amount of the iron contained inevitably in the composition is regulated to 0.5-45ppm. |
