发明名称 Electron-beam-induced information storage in hydrogenated amorphous silicon device
摘要 A method for recording and storing information in a hydrogenated amorphous silicon device, comprising: depositing hydrogenated amorphous silicon on a substrate to form a charge-collection device; and generating defects in the hydrogenated amorphous silicon device, wherein the defects act as recombination centers that reduce the lifetime of carriers, thereby reducing charge-collection efficiency; and thus in the charge-collection mode of scanning probe instruments, regions of the hydrogenated amorphous silicon device that contain the defects appear darker in comparison to regions of the device that do not contain the defects, leading to a contrast formation for pattern recognition and information storage, in the device, which darkened areas can be restored to their original charge-collection efficiency by heating the hydrogenated amorphous silicon to a temperature of about 100 DEG C. to 250 DEG C. for a sufficient period of time to provide for such restoration.
申请公布号 US4613519(A) 申请公布日期 1986.09.23
申请号 US19850713352 申请日期 1985.03.18
申请人 THE UNITED STATE OF AMERICA AS REPRESENTED BY THE UNITED STATES DEPARTMENT OF ENERGY 发明人 YACOBI, BEN G.
分类号 G06K1/12;G11B7/00;G11B9/08;G11B9/10;G11B11/00;(IPC1-7):B05D3/06 主分类号 G06K1/12
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