| 摘要 |
PURPOSE:To enable the replacement of the adhesion preventing plate in vacuum to easily be performed within a short time by attaching one end of the adhesion preventing plate disposed along the inner wall of a vacuum vessel to the take-up shaft. CONSTITUTION:The ion beam of an ion source 2 is drawn out from a grid 3 and impinges on a wafer 5 to perform etching, and the material to be etched deposits on an adhesion preventing film 8. After the use for a certain fixed time, but before the occurrence of the phenomenon that the foreign particles depositing on the adhesion preventing film 8 peel off, by manupulating and rotating a take-up shaft 6 externally of a vacuum vessel 1 to wind up the portion of the adhesion preventing film 8 on which the foreign particles deposited, a wind-back shaft 7 is rolled back, and the new portion of the adhesion preventing film 8 mounted on the shaft 7 is arranged on the wall surface of the vessel 1. This enables the replacement with the new portion of the adhesion preventing film 8 to be performed quickly and easily in vacuum. |
