发明名称 Two-layer negative resist
摘要 The erosion rate of a layer of negative-working resist is markedly reduced by forming thereon a thin layer of polyfunctional acrylate or methylacrylate monomer. Upon irradiation, the monomer insolubilizes at a faster rate than the resist thereby forming a crust thereon. The result is reduced erosion, improved edge acuity and fewer pinholes in the developed resist pattern.
申请公布号 US4612270(A) 申请公布日期 1986.09.16
申请号 US19850711720 申请日期 1985.03.14
申请人 RCA CORPORATION 发明人 PAMPALONE, THOMAS R.;HOLDER, PAULA M.
分类号 G03F7/095;(IPC1-7):G03C5/00 主分类号 G03F7/095
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