发明名称 |
Two-layer negative resist |
摘要 |
The erosion rate of a layer of negative-working resist is markedly reduced by forming thereon a thin layer of polyfunctional acrylate or methylacrylate monomer. Upon irradiation, the monomer insolubilizes at a faster rate than the resist thereby forming a crust thereon. The result is reduced erosion, improved edge acuity and fewer pinholes in the developed resist pattern.
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申请公布号 |
US4612270(A) |
申请公布日期 |
1986.09.16 |
申请号 |
US19850711720 |
申请日期 |
1985.03.14 |
申请人 |
RCA CORPORATION |
发明人 |
PAMPALONE, THOMAS R.;HOLDER, PAULA M. |
分类号 |
G03F7/095;(IPC1-7):G03C5/00 |
主分类号 |
G03F7/095 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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