| 摘要 |
PURPOSE:To increase development processing capacity and to prevent insoluble matter by using a developing soln. dissolving a chelating agent to develop a water-soluble photosensitive resin composed essentially of polyamide having sulfonate groups. CONSTITUTION:The water-soluble photosensitive resin composed essentially of a polyamide having sulfonate groups is obtained by reacting a polyamide reactant, before completing polymn. reaction of polyamide, with an aromatic or aliphatic sulfonic acid salts having two amide-forming functional groups. This resin is developed with a developing soln. dissolving the chelating agent to form a pattern. As the chelating agent, polyaminocarboxylate, such as disodium ethylenediamine-tetraacetate and tetrasodium ethylenediaminetetra acetate, and it is used in an amt. of 50-10,000ppm per water to be used for the soln. |
