发明名称 PHOTOSENSITIVE COMPOSITION
摘要 PURPOSE:To obtain the titled composition having no tackiness, a high resolution and a high density and capable of etching by incorporating a polymer which is obtd. by reacting isocyanate ethyl methacrylate to a specific vinyl type linear polymer and a specific glass transition temp., and a photosensitizer to the titled composition. CONSTITUTION:The titled composition comprises the polymer which is obtd. by reacting isocyanate ethyl methacrylate to the vinyl type linear polymer obtd. by copolymerizing 5-85wt% a compd. contg. each one of vinyl and hydroxy groups in a molecule, 10-40wt% a compd. contg. one of vinyl group and a carboxyl group in a molecule, and <=80wt% a compd. having one of the vinyl group in a molecule, in 0.3-1.3 an equivalent ratio of an NCO group to an OH group of said polymer, and also has the glass transition temp. of 40-130 deg.C, and the sensitizer capable of forming a free radical with an active ray. As the composition has no tackiness, an exposure, a development and an etching may be performed by directly laminating a negative film on said composition, without contaminating the negative film. The composition is suitable to obtain a distribution panel having a resolution and a high density.
申请公布号 JPS61200536(A) 申请公布日期 1986.09.05
申请号 JP19850041699 申请日期 1985.03.01
申请人 HITACHI CHEM CO LTD 发明人 SUGASAWA NOBORU;HAYASHI NOBUYUKI
分类号 C08F299/00;C08F2/48;C08F290/00;C08F299/06;G03F7/004;G03F7/027;G03F7/033;G03F7/035;G03F7/038;H01L21/027;H05K3/00;H05K3/06 主分类号 C08F299/00
代理机构 代理人
主权项
地址