| 摘要 |
PURPOSE:To acknowledge the abnormality of the number of wafers automatically before and after treatment, by measuring and monitoring the amount of the pulverized dust pieces of the wafers yielded in a centrifugal drying apparatus, which dries the wafers. CONSTITUTION:In a drying chamber 5a of a centrifugal drying apparatus 5, the amount of the dust pieces of 2.0-5.0mum, when wafers are not broken, is zero. When the wafers are broken, 100 or more broken dust pieces of the wafers having the size of 2.0-5.0mum are measured. Then a dust detector 7 is provided. The amount of the broken dust pieces of the wafers in the drying chamber 5a is always monitored by the detector 7. When the dust pieces of the sizes of 2.0-5.0mum are measured, a warning instruction (a) is issued. Based on warning instruction, occurrence of the breakdown of the wafers is the drying chamber 5a is reported to an operator, so that appropriate measures are taken before the next operation. |
