发明名称 PHOTOCURABLE COMPOSITION
摘要 PURPOSE:A composition excellent in photocurability, coating quality, etc., obtained by mixing a compound containing an epoxy group and a photocurable unsaturated double bond with an organometallic compound, a silicon compound which generates silanol groups upon irradiation with light and a surfactant. CONSTITUTION:The purpose photocurable composition is obtained by mixing a compound (A) having at least one epoxy group and at least one photocurable unsaturated double bond in one molecule (e.g., acrylated epoxy resin) with an organometallic compound (B), e.g., trismethoxyaluminum, a silicon compound (C) which generates silanol groups upon irradiation with light (e.g., formula I or formula II), a surfactant (D) (e.g., formula III or tetramethyldisiloxane) and, optionally, a sensitizer and necessary additives such as a metal naphthenate. This composition is excellent in the homogeneity, smoothness, etc., of a film and can be suitably used for paints, inks, sealants, etc.
申请公布号 JPS61197626(A) 申请公布日期 1986.09.01
申请号 JP19850037461 申请日期 1985.02.28
申请人 TOSHIBA CORP 发明人 WADA HIROSUKE;HAYASE SHUJI;SUZUKI SHIYUICHI;WADA MORIYASU;MIKOGAMI YUKIHIRO
分类号 C08G59/00;C08G59/18;C08G59/20;C08G59/40;C08G59/68;C08J7/04;C09D5/00;C09D163/00 主分类号 C08G59/00
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