| 摘要 |
PURPOSE:To realize a large area of an amorphous or crystalline deposited film containing carbon while improving its various characteristics, speed of film formation and reproducibility and making quality of the film uniform by a method wherein particular activated seeds which are activated separately beforehand in spaces different from a film forming space are brought into chemical reaction. CONSTITUTION:Instead of creating plasma in a film forming space where a deposited film 10 consisting of an intermediate layer 12 and a photosensitive layer 13 is formed, an activated seed produced by decomposing a compound containing carbon and halogen and an activated seed produced from a carbon containing compound for film formation are introduced into the film forming space. By applying heat energy to those seeds, chemical interaction is created or promoted and amplified. The deposited film 10 formed with this method does not get harmful influence from etching, abnormal discharge or the like. Light energy is applied all over a substrate 11 by a suitable optical system to form the deposited film 10. |
