| 摘要 |
PURPOSE:To contrive the improvement in characteristics, film-forming speed, and reproducibility of the amorphous or crystalline deposited film containing carbon and the uniformity of film quality, by a method wherein a specific activa tion seed previously activated in a space different from the film-forming space is made to carry out chemical reaction. CONSTITUTION:In the film-forming space to form a deposited film 10 with an intermediate layer 12 and a photosensitive layer 13 over a substrate 11, an activation seed produced by decomposing a compound containing carbon and halogen and an activation seed produced out of a film-forming chemical substance which chemically interacts with it are separately introduced, and the deposited film 10 is formed over the substrate 11 by making these activation seeds to carry out chemical reaction by irradiation with photo energy. The deposited film 10 formed in such as manner does not receive adverse effects caused by etching action or another action such as abnormal discharge. |
