发明名称 |
Photochemical process for substrate surface preparation. |
摘要 |
<p>A substrate having an undesired native oxide layer formed on the surface thereof is treated at a low temperature by exposure to a chosen vapor phase hydrogen-containing precursor in the presence of radiation of a selected wavelength. Upon radiation-inducement, neutral hydrogen species are formed from the precursor and interact with the native oxide to convert the native oxide to a chemically reduced form. By this process, thermal damage and charge damage to the substrate are avoided and the electrical properties of a subsequently formed device are enhanced.</p> |
申请公布号 |
EP0191143(A1) |
申请公布日期 |
1986.08.20 |
申请号 |
EP19850114217 |
申请日期 |
1985.11.07 |
申请人 |
HUGHES AIRCRAFT COMPANY |
发明人 |
ROGERS, HARVEY N. JR.;HALL, JAMES T. |
分类号 |
H01L21/302;C23C8/06;C23C16/02;C23C16/40;H01L21/306;H01L21/311;H01L21/465;H01L21/4757 |
主分类号 |
H01L21/302 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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