| 摘要 |
PURPOSE:To obtain high reflection factor and thermally stable high output by a method wherein a dielectric layer, which possesses lambda/4 thermal film thickness for prescribed wavelength lambda, is formed mutually on a silver film and number of total layers is six layers and more, then the first dielectric layer, whose thermal film thickness is 2lambda/4, is formed at an outermost layer. CONSTITUTION:A silver film is formed on a surface of a glass substrate and an SiO2 layer is formed as the first dielectric layer, whose film thickness is lambda/4 of prescribed wavelength lambda. Consequently, one layer selected from among TiO2, CeO2, HfO2 and ZrO2 as the second dielectric layer, whose thermal thickness is lambda/4, is formed and additionally the first and the second dielectric layers are formed mutually in succession, then number of total layers is six layers and more, and the first dielectric layer, whose thermal film thickness is 2lambda/4 at an outermost layer. Thereby, the titled reflector can be produced with less than 1/3 film layer's number in comparison with the conventional multilayer reflector and improvement of laser output and thermal stability is realized. |
